Optimization of optical properties for single-layer halftone masks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2197, Issue , 1994, Pages 99-110

  Ito, Shin Ichi ^a   Hazama, Hiroaki ^a   Kamoa, Takashi ^a   Miyazaki, Hideya ^a   Sato, Hiroyuki ^a   Hayashi, Kenji ^a   Shigemitsu, Humiaki ^a   Mon, Ichiro ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

FILMS; REFRACTIVE INDEX;

ANNULAR ILLUMINATION; EXTINCTION COEFFICIENTS; HALFTONE MASKS; LINE-AND-SPACE; SINGLE LAYER;

FLUORINE COMPOUNDS;

EID: 85010171275     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.175486     Document Type: Conference Paper

References (8)

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2. A. Callegari, A.T. Pomerene, HJ. Hovel, E.D. Babich, S. Purushothaman and J.M. Shaw, "Optical properties of hydrogenated amorphous-carbon film for attenuated phase-shift mask applications", J. Vac. Sci. Technol. B11(6), 2697 (1993)
3. Y. Iwabuchi, J. Ushioda, H. Tanabe, Y. Ogura and S. Kishida, "Monolayer Halftone Phase-shifting Mask for KrF Excimer Laser Lithography ", Jpn. J. Appl. Phys. 32, 5900 (1993)
4. N. Yoshioka, J. Miyazaki, H. Kusunose, K. Hosono, M. Nakajima, H. Morimoto, Y. Watakabe and K. Tsukamoto, "Practical attenuated phase-shifting mask with a single-layer absorptive shifter of MoSiO and MoSiON for ULSI fabrication", IEDM. Proc. 653 (1993)
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8. E. Tamechika, S. Matsuo, K. Komatsu, Y. Takeuchi, Y. Mimura and K. Harada, "Investigation of single sideband optical lithography using oblique incident illumination", J. Vac. Sci. Technol. B10(6), 3027 (1992)