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Volumn 311, Issue 1-2, 1997, Pages 151-156
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The effect of additional ion/plasma assistance in CNx-film deposition based on a filtered cathodic arc
a a a a a b |
Author keywords
Carbon; Ion bombardment; Nitrides; Plasma processing and deposition
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Indexed keywords
COMPOSITION;
CRYSTAL MICROSTRUCTURE;
DEPOSITION;
ELECTRIC VARIABLES MEASUREMENT;
ION BOMBARDMENT;
ION IMPLANTATION;
IONIZATION;
MASS SPECTROMETRY;
MECHANICAL PROPERTIES;
NITRIDES;
PLASMA APPLICATIONS;
PROBES;
CARBON NITRIDE;
ELECTRIC PROBE MEASUREMENT;
ENERGY RESOLVED MASS SPECTROSCOPY;
FILTERED CATHODIC ARC;
KAUFMAN ION SOURCE;
THIN FILMS;
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EID: 0031387019
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/S0040-6090(97)00470-7 Document Type: Article |
Times cited : (4)
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References (13)
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