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Volumn 311, Issue 1-2, 1997, Pages 151-156

The effect of additional ion/plasma assistance in CNx-film deposition based on a filtered cathodic arc

Author keywords

Carbon; Ion bombardment; Nitrides; Plasma processing and deposition

Indexed keywords

COMPOSITION; CRYSTAL MICROSTRUCTURE; DEPOSITION; ELECTRIC VARIABLES MEASUREMENT; ION BOMBARDMENT; ION IMPLANTATION; IONIZATION; MASS SPECTROMETRY; MECHANICAL PROPERTIES; NITRIDES; PLASMA APPLICATIONS; PROBES;

EID: 0031387019     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00470-7     Document Type: Article
Times cited : (4)

References (13)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.