Carbon contamination in synchrotron-radiation-stimulated al deposition using a low temperature condensed layer of dimethyl aluminum hydride

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 35, Issue 12 SUPPL. B, 1996, Pages 6588-6591

  Imaizumi, Yoshiaki ^a,b   Tsusaka, Yoshiyuki ^a   Urisu, Tsuneo ^a   Ibuki, Toshio ^a  

^a INSTITUTE FOR MOLECULAR SCIENCE   (Japan)

^b GRADUATE UNIVERSITY FOR ADVANCED STUDIES   (Japan)

Author keywords

Carbon contamination; Chemical vapor deposition; Photo CVD; Site specific effect; Synchrotron radiation; X ray photoelectron spectroscopy

Indexed keywords

EID: 0042654055     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.6588     Document Type: Article

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