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Progress in Crystal Growth and Characterization of Materials

Volumn 35, Issue 2-4, 1997, Pages 117-149

Computational chemistry predictions of reaction processes in organometallic vapor phase epitaxy

(4) Simka, Harsano a,b Willis, Brian G b Lengyel, Istvan b Jensen, Klavs F b

a INTEL CORPORATION (United States)

b Massachusetts Institute of Technology Cambridge (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM COMPOUNDS; BOND STRENGTH (CHEMICAL); HYDRIDES; MOLECULAR STRUCTURE; PYROLYSIS; REACTION KINETICS; SILICON; THERMODYNAMIC PROPERTIES;

DENSITY FUNCTIONAL THEORY (DFT); HARTREE FOCK MOLECULAR ORBITAL TECHNIQUES; QUANTUM CHEMISTRY;

METALLORGANIC VAPOR PHASE EPITAXY;

EID: 0031362497 PISSN: 09608974 EISSN: None Source Type: Journal
DOI: 10.1016/S0960-8974(98)00002-3 Document Type: Article

Times cited : (56)

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