New ellipsometric approach to critical dimension metrology utilizing form birefringence inherent in a submicron line-and-space pattern

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 12 SUPPL. B, 1997, Pages 7720-7725

  Takeuchi, Seiji ^a   Yoshii, Minoru ^a   Yamamoto, Masaki ^b  

^a CANON INC   (Japan)

^b TOHOKU UNIVERSITY   (Japan)

Author keywords

Birefringence; Ellipsometry; Latent images; Linewidth; Metrology; Subwavelength grating

Indexed keywords

BIREFRINGENCE; DIFFRACTION GRATINGS; ELLIPSOMETRY; REFRACTIVE INDEX;

CRITICAL DIMENSION (CD) METROLOGY;

PHOTORESISTS;

EID: 0031346371     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.7720     Document Type: Article

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