Precise line-and-space monitoring results by ellipsometry

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 36, Issue 2 PART A, 1997, Pages

  Arimoto, Hiroshi ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

Cross sectional line shape monitoring; Ellipsometry; Linewidth monitoring

Indexed keywords

ELLIPSOMETRY; NONDESTRUCTIVE EXAMINATION; PHOTORESISTS;

LINE AND SPACE MONITORING;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0031069249     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.l173     Document Type: Article

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