Nano-machining of C60 films deposited on H-passivated Si(111)

Journal of Physics D: Applied Physics

Volumn 30, Issue 24, 1997, Pages 3307-3311

  Miao, P ^a   Robinson, A W ^a   Palmer, R E ^a  

^a UNIVERSITY OF BIRMINGHAM   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; FILMS; MACHINING; MOLECULES; NANOTECHNOLOGY; PASSIVATION; SCANNING TUNNELING MICROSCOPY; SEMICONDUCTING SILICON; SOLUTIONS; SURFACE ROUGHNESS; SURFACES;

CARBON FILMS; NANOMACHINING;

FULLERENES;

EID: 0031343302     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/30/24/007     Document Type: Article

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