Development of amorphous silicon based P-I-N solar cell in a superstrate structure with P-microcrystalline silicon as window layer

Conference Record of the IEEE Photovoltaic Specialists Conference

Volumn , Issue , 1996, Pages 1101-1104

  Rath, J K ^a   van der Werf, C H M ^a   Rubinelli, F A ^a   Schropp, R E I ^a  

^a UTRECHT UNIVERSITY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; CRYSTAL STRUCTURE; CRYSTALLINE MATERIALS; DIFFUSION; INTERFACES (MATERIALS); PERFORMANCE; SEMICONDUCTING SILICON; SHORT CIRCUIT CURRENTS; THIN FILMS; TUNNEL JUNCTIONS;

ELECTRON BACK DIFFUSION; MICROCRYSTALLINE SILICON; OPEN CIRCUIT VOLTAGE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SINGLE JUNCTION SOLAR CELLS; SUPERSTRATE STRUCTURE;

SILICON SOLAR CELLS;

EID: 0030385344     PISSN: 01608371     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/pvsc.1996.564323     Document Type: Conference Paper

References (7)