메뉴 건너뛰기




Volumn 18, Issue 11, 1997, Pages 523-525

Via hole technology for thin-film transistor circuits

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; GATES (TRANSISTOR); LASER APPLICATIONS; LIQUID CRYSTAL DISPLAYS; SEMICONDUCTING SILICON; SUBSTRATES;

EID: 0031272055     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/55.641433     Document Type: Article
Times cited : (14)

References (12)
  • 1
    • 0029521643 scopus 로고
    • Limitations and prospects of a-Si:H TFT's
    • W. E. Howard, "Limitations and prospects of a-Si:H TFT's," J. Soc. Inform. Dis., vol. 3, pp. 127-132, 1995.
    • (1995) J. Soc. Inform. Dis. , vol.3 , pp. 127-132
    • Howard, W.E.1
  • 2
    • 0002611756 scopus 로고    scopus 로고
    • A six-mask ThT-LCD process using copper-gate metallurgy
    • paper 22.1
    • P. M. Fryer et al., "A six-mask ThT-LCD process using copper-gate metallurgy," in SID 96 Dig., 1996, paper 22.1, pp. 333-336.
    • (1996) SID 96 Dig. , pp. 333-336
    • Fryer, P.M.1
  • 3
    • 11644304886 scopus 로고    scopus 로고
    • Low-resistivity Al alloy for large-size and high-resolution TFT-LCD's
    • M. Hayashi et al., "Low-resistivity Al alloy for large-size and high-resolution TFT-LCD's," in SID 97, Dig. Tech. Papers, vol. 28, 1997, pp. 885-888.
    • (1997) SID 97, Dig. Tech. Papers , vol.28 , pp. 885-888
    • Hayashi, M.1
  • 4
    • 84988182525 scopus 로고
    • Numerical simulations for large-area TFT-LCD's
    • R. L. Wisnieff, "Numerical simulations for large-area TFT-LCD's," in SID'93, 1993, pp. 731-734.
    • (1993) SID'93 , pp. 731-734
    • Wisnieff, R.L.1
  • 5
    • 33644610274 scopus 로고    scopus 로고
    • Modeling of gate line delay in very large active matrix liquid crystal displays
    • to be published
    • Q. Zhang, D. S. Shen, H. Gleskova, and S. Wagner, "Modeling of gate line delay in very large active matrix liquid crystal displays," IEEE Trans. Electron Devices, to be published.
    • IEEE Trans. Electron Devices
    • Zhang, Q.1    Shen, D.S.2    Gleskova, H.3    Wagner, S.4
  • 6
    • 3643094275 scopus 로고    scopus 로고
    • Resonetics, Inc., 4 Bud Way 21, Nashua, NH 03063
    • Resonetics, Inc., 4 Bud Way 21, Nashua, NH 03063.
  • 7
  • 8
    • 0031375783 scopus 로고    scopus 로고
    • Via-hole addressed TFT and process for large-area a-Si:H electronics
    • M. Hack, R. Schropp, E. Schiff, I. Shimizu, and S. Wagner, Eds.
    • H. Gleskova, S. Wagner, and D. S. Shen, "Via-hole addressed TFT and process for large-area a-Si:H electronics," in Amorphous and Microcrystalline Silicon Technology - 1997, M. Hack, R. Schropp, E. Schiff, I. Shimizu, and S. Wagner, Eds.; also in Proc. Mater. Res. Soc. Symp., vol. 467, to be published.
    • Amorphous and Microcrystalline Silicon Technology - 1997
    • Gleskova, H.1    Wagner, S.2    Shen, D.S.3
  • 9
    • 0031375783 scopus 로고    scopus 로고
    • to be published
    • H. Gleskova, S. Wagner, and D. S. Shen, "Via-hole addressed TFT and process for large-area a-Si:H electronics," in Amorphous and Microcrystalline Silicon Technology - 1997, M. Hack, R. Schropp, E. Schiff, I. Shimizu, and S. Wagner, Eds.; also in Proc. Mater. Res. Soc. Symp., vol. 467, to be published.
    • Proc. Mater. Res. Soc. Symp. , vol.467
  • 10
    • 0030414068 scopus 로고    scopus 로고
    • Film-substrate a-Si solar cells and their novel process technologies
    • S. Fujikake et al., "Film-substrate a-Si solar cells and their novel process technologies," in Conf. Rec. 25th IEEE Photovoltaic Specialists Conf., 1996, pp. 1045-1048.
    • (1996) Conf. Rec. 25th IEEE Photovoltaic Specialists Conf. , pp. 1045-1048
    • Fujikake, S.1
  • 11
    • 0030348789 scopus 로고    scopus 로고
    • Optimization of the ferric chloride etching of shadow masks
    • and refs. 1-2 cited therein
    • J. J. Moscony et al., "Optimization of the ferric chloride etching of shadow masks," J. Soc. Inform. Display, vol. 4, pp. 231-239, 1996, and refs. 1-2 cited therein.
    • (1996) J. Soc. Inform. Display , vol.4 , pp. 231-239
    • Moscony, J.J.1
  • 12
    • 0030406631 scopus 로고    scopus 로고
    • Integration of organic LED's and amorphous silicon TFT's onto unbreakable metal foil substrates
    • C. C. Wu et al., "Integration of organic LED's and amorphous silicon TFT's onto unbreakable metal foil substrates," in IEDM Tech. Dig., 1996, pp. 957-959.
    • (1996) IEDM Tech. Dig. , pp. 957-959
    • Wu, C.C.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.