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ULSI DRAM/SIMOX with stacked capacitor cells for low-voltage operation
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T. Eimori, T. Oashi, H. Kimura, Y. Yamaguchi, T. Iwamatsu, T. Tsuruda, K. Suma, H. Hidaka, Y. Inoue, T. Nishimura, S. Satoh, and H. Miyoshi, "ULSI DRAM/SIMOX with stacked capacitor cells for low-voltage operation," in IEDM Tech. Dig., 1993, pp. 45-48.
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H.-S. Kim, S.-B. Lee, D.-U. Choi, J.-H. Shim, K.-C. Lee, K.-P. Lee, K.-N. Kim, and J.-W. Park, "A high performance 16 M DRAM on a thin film SOI," in VLSI Symp. Tech. Dig., 1995, pp. 143-144.
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K. Shimomura, H. Shimano, F. Okuda, N. Sakashita, T. Oashi, Y. Yamaguchi, T. Eimori, M. Inuishi, K. Arimoto, S. Maegawa, Y. Inoue, T. Nishimura, S. Komori, K. Kyuma, A. Yasuoka, and H. Abe, "A 1 V 46 ns 16 Mb SOI-DRAM with body control technique," in ISSCC Dig. Tech. Papers, 1997, pp. 68-69.
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0030422230
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T. Oashi, T. Eimori, F. Morishita, T. Iwamatsu, Y. Yamaguchi, F. Okuda, K. Shimomura, H. Shimano, N. Sakashita, K. Arimoto, Y. Inoue, S. Komori, M. Inuishi, T. Nishimura, and H. Miyoshi, "16 Mb DRAM/SOI technologies for sub-1 V operation," in IEDM Tech. Dig., 1996, pp. 609-612.
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