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Volumn 32, Issue 11, 1997, Pages 1712-1718

A 1-V 46-ns 16-Mb SOI-DRAM with body control technique

Author keywords

Circuit simulation; CMOS integrated circuits; DRAM chips; Integrated circuit design; Silicon on insulator technology

Indexed keywords

CMOS INTEGRATED CIRCUITS; COMPUTER SIMULATION; ELECTRIC POWER SUPPLIES TO APPARATUS; EQUALIZERS; INTEGRATED CIRCUIT LAYOUT; LEAKAGE CURRENTS; LOGIC CIRCUITS; PULSE AMPLIFIERS; SILICON ON INSULATOR TECHNOLOGY;

EID: 0031270360     PISSN: 00189200     EISSN: None     Source Type: Journal    
DOI: 10.1109/4.641691     Document Type: Article
Times cited : (6)

References (14)
  • 6
  • 13
    • 0027813428 scopus 로고
    • Novel NICE (nitrogen implantation into CMOS gate electrode and source-drain) structure for high reliability and high performance 0.25 μm dual gate CMOS
    • T. Kuroi, T. Yamaguchi, M. Shirahata, Y. Okumura, Y. Kawasaki, M. Inuishi, and N. Tsubouchi, "Novel NICE (nitrogen implantation into CMOS gate electrode and source-drain) structure for high reliability and high performance 0.25 μm dual gate CMOS," in IEDM Tech. Dig., 1993, pp. 325-328.
    • (1993) IEDM Tech. Dig. , pp. 325-328
    • Kuroi, T.1    Yamaguchi, T.2    Shirahata, M.3    Okumura, Y.4    Kawasaki, Y.5    Inuishi, M.6    Tsubouchi, N.7


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.