Very high rate coating deposition with intense ion and/or electron bombardment

Surface and Coatings Technology

Volumn 86-87, Issue PART 1, 1996, Pages 292-301

  Korenev, Sergey A ^a   Coll, Bernard F ^b   Perry, Anthony J ^c  

^a JOINT INSTITUTE FOR NUCLEAR RESEARCH   (Russian Federation)

^b MOTOROLA INC   (United States)

^c ISM Technologies Inc   (United States)

Author keywords

Coating deposition; Electron irradiation; Ion beam mixing; Pulsed beams

Indexed keywords

DEPOSITION; ELECTRON BEAMS; ION BEAMS; ION BOMBARDMENT; IRRADIATION; MIXING; TEMPERATURE;

COATING DEPOSITION; ELECTRON IRRADIATION; EXPLOSIVE ION EMISSION; ION BEAM MIXING; PULSED BEAMS;

COATING TECHNIQUES;

EID: 0030381672     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(96)02979-9     Document Type: Article

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