Comments on the utilization of noise measurements for the characterization of electromigration in metal lines

Microelectronics Reliability

Volumn 37, Issue 10-11, 1997, Pages 1607-1610

  Ciofi, C ^a   Dattilo, V ^a   Neri, B ^a  

^a UNIVERSITY OF PISA   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROMIGRATION; SEMICONDUCTOR DEVICE MODELS; SPURIOUS SIGNAL NOISE;

LOW FREQUENCY NOISE MEASUREMENT; SPECTRAL ANALYSIS OF RESISTANCE FLUCTUATION;

SIGNAL NOISE MEASUREMENT;

EID: 0031246741     PISSN: 00262714     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0026-2714(97)00121-2     Document Type: Article

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