SOI material technology using plasma immersion ion implantation

IEEE International SOI Conference

Volumn , Issue , 1996, Pages 48-49

  Lu, X ^a   Iyer, S S K ^a   Min, J ^a   Fan, Z ^a   Liu, J B ^a   Chu, P K ^a   Hu, C ^a   Chueng, N W ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; BONDING; COST EFFECTIVENESS; CRYSTAL MICROSTRUCTURE; CRYSTALLINE MATERIALS; INTERFACES (MATERIALS); ION IMPLANTATION; PLASMA APPLICATIONS; PRODUCTION CONTROL; SILICON ON INSULATOR TECHNOLOGY; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY;

MICROCAVITY FORMATION; PLASMA IMMERSION ION IMPLANTATION; SEPARATION BY PLASMA IMPLANTATION OF OXYGEN (SPIMOX);

SILICON WAFERS;

EID: 0030415285     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (3)