Scanning Maxwell stress microscopy for UHV applications

Nanotechnology

Volumn 8, Issue 3 SUPPL. A, 1997, Pages

  Inoue, Takahito ^a   Itoh, Junji ^a   Yokoyama, Hiroshi ^a  

^a ELECTROTECHNICAL LABORATORY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

MICROSCOPIC EXAMINATION; SEMICONDUCTING SILICON; VACUUM APPLICATIONS;

SCANNING MAXWELL STRESS MICROSCOPY (SMM); ULTRAHIGH VACUUM (UHV) APPLICATIONS;

NANOTECHNOLOGY;

EID: 0031235811     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/8/3A/005     Document Type: Article

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