Ion energy and plasma characterization in a silicon filtered cathodic vacuum arc

Journal of Applied Physics

Volumn 79, Issue 3, 1996, Pages 1287-1291

  Bilek, M M M ^a   Chhowalla, M ^a   Weiler, M ^b   Milne, W I ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001168191     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.362654     Document Type: Article

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