Filtered Vacuum Arc Deposition of Semiconductor Thin Films

IEEE Transactions on Plasma Science

Volumn 23, Issue 6, 1995, Pages 939-944

  Boxman, Raymond L ^a   Goldsmith, Samuel ^a   Ben Shalom, Amir ^a   Kaplan, Larissa ^a   Arbilly, David ^a   Gidalevich, Evgeny ^a   Zhitomirsky, Vladimir ^a   Ishaya, Amiel ^a   Keidar, Michael ^a   Beilis, Isak I ^a  

^a TEL AVIV UNIVERSITY   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CHARACTERIZATION; DEPOSITION; ELECTRIC ARCS; ELECTRIC CONDUCTIVITY MEASUREMENT; ELECTRIC CONDUCTIVITY OF SOLIDS; MAGNETIC FIELDS; MICROSTRUCTURE; PLASMAS; SEMICONDUCTING TIN COMPOUNDS; THIN FILMS; VACUUM APPLICATIONS;

CATHODE SPOTS; FILTERED VACUUM ARC DEPOSITION; LIQUID DROPLETS; OPTIMAL CONDUCTIVITY; PUMPING EFFECTS; SEMICONDUCTOR THIN FILMS; TRANSPARENT TIN OXIDE;

SEMICONDUCTING FILMS;

EID: 0029490564     PISSN: 00933813     EISSN: 19399375     Source Type: Journal    
DOI: 10.1109/27.476479     Document Type: Article

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