In situ spectroelectrochemical study of the anodic dissolution of silicon by potential-difference and electromodulated FT-IR spectroscopy

Applied Spectroscopy

Volumn 51, Issue 4, 1997, Pages 519-525

  Ozanam, F ^a   Da Fonseca, C ^a   Venkateswara Rao, A ^a   Chazalviel, J N ^a  

^a LABORATOIRE DE PHYSIQUE DE LA MATIÈRE CONDENSÉE   (France)

Author keywords

Electrochemistry; Fluoride; Infrared; Interface; Oxide; Silicon

Indexed keywords

ADSORPTION; CHEMICAL BONDS; DESORPTION; DISSOLUTION; ELECTROCHEMICAL ELECTRODES; ELECTROCHEMISTRY; ELECTROLYTES; ELECTROLYTIC POLISHING; FOURIER TRANSFORM INFRARED SPECTROSCOPY; INTERFACES (MATERIALS); OXIDES; STOICHIOMETRY;

ANODIC DISSOLUTION; ELECTROMODULATED INFRARED SPECTROSCOPY; POTENTIAL DIFFERENCE SPECTROSCOPY; SPECTROELECTROCHEMISTRY;

POROUS SILICON;

EID: 0031117884     PISSN: 00037028     EISSN: None     Source Type: Journal    
DOI: 10.1366/0003702971940512     Document Type: Article

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