메뉴 건너뛰기




Volumn 70, Issue 7, 1997, Pages 811-813

Stimulated emission at 300 K from photopumped GaN grown by plasma-assisted molecular beam epitaxy with an inductively coupled plasma source

Author keywords

[No Author keywords available]

Indexed keywords

EMISSION SPECTROSCOPY; MOLECULAR BEAM EPITAXY; NEODYMIUM LASERS; NITROGEN; OPTICAL PUMPING; PHOTOLUMINESCENCE; PLASMA APPLICATIONS; THERMAL DIFFUSION;

EID: 0031078554     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.118230     Document Type: Article
Times cited : (14)

References (24)
  • 22
    • 0003685207 scopus 로고
    • EMIS Data Review Series INSPEC The Institution of Electrical Engineering, London
    • Properties of Group III Nitrides, edited by J. H. Edgar EMIS Data Review Series INSPEC (The Institution of Electrical Engineering, London, 1994), Vol. II.
    • (1994) Properties of Group III Nitrides , vol.2
    • Edgar, J.H.1
  • 24
    • 85033314750 scopus 로고    scopus 로고
    • note
    • diff is the diffusion current. Note that for both currents μ represents the same mobility associated with ambipolar transport; we assume that the crystal field acts equally on electrons and holes.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.