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H. Lin, N. J. Wu, K. Xie, X. Y. Li, and A. Ignatiev, Appl. Phys. Lett. 65, 953 (1994); Y. Watanabe, ibid. 66, 1770 (1995); C. H. Ahn, J.-M. Triscone, N. Archibald, M. Decroux, R. H. Hammond, T. H. Geballe, O. Fischer, and M. R. Beasley, Science 269, 373 (1995); Z. W. Dong, Z. Trajanovic, T. Boettcher, I. Takeuchi, V. Talyansky, C.-H. Chen, R. Ramesh, and T. Venkatesan (to be published).
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9
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85033290636
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note
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When charge injection is the cause of the memory effect, the transfer characteristic has a sense of rotation opposite to the sense of rotation of the charge displacement. This is described in Refs. 7 and 8, for example.
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11
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C. H. Seager, D. McIntyre, B. A. Tuttle, and J. Evans, Integr. Ferroelectr. 6, 47 (1995); C. H. Seager, D. C. McIntyre, W. L. Warren, and B. A. Tuttle, Appl. Phys. Lett. 68, 2660 (1996).
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14
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85033306919
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note
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Previously, large memory effects were reported in ferroelectric transistors with a bulk constituent, i.e., made of a semiconductor thin film on a ceramic ferroelectric substrate (e.g., Ref. 10) or made of a ferroelectric thin film on a crystalline Si substrate (e.g., Ref. 11). In all-thin-film ferroelectric transistors, memory effects were reported with a remnant on/off ratio slightly above unity (see Refs. 2 and 3) (note that we quoted the results of Watanabe incorrectly in our publication (Ref. 3).
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16
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Nakao, Y.1
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Y. Nakao, T. Nakamura, A. Kamisawa, and H. Takasu, Integr. Ferroelectr. 6, 23 (1995); T. Nakamura, Y. Nakao, A. Kamisawa, and H. Takasu, ibid. 9, 179 (1995).
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Nakamura, T.1
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