Sputtering conditions for depositing co-cr-ta films with voidless morphology and nano-size domains

IEEE Transactions on Magnetics

Volumn 32, Issue 5 PART 1, 1996, Pages 3816-3818

  Kadokiira, Sadao ^a  

^a TEIJIN LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CALORIMETERS; COBALT ALLOYS; ETCHING; FILM GROWTH; HEAT EXCHANGERS; HEAT FLUX; ION BOMBARDMENT; MORPHOLOGY; NANOSTRUCTURED MATERIALS; PLASMAS; SPUTTER DEPOSITION; TRANSMISSION ELECTRON MICROSCOPY;

ANISOTROPY FIELD; CALORIMETER SENSOR; COBALT CHROMIUM TANTALUM FILMS; FACING TARGETS SPUTTERING; VOIDLESS MORPHOLOGY;

THIN FILMS;

EID: 0030245067     PISSN: 00189464     EISSN: None     Source Type: Journal    
DOI: 10.1109/20.539182     Document Type: Article

References (5)

1. S. Kadokura and M. Naoe: " Plasma effects on the Co-Cr deposition in opposing targets sputtering method",IEEE Trans. on Mag. MAG-18, pp. 1113-1115 (1982)
2. S. Kadokura and M. Naoe: " Microstructure and tribological properties of Co-Cr thin films deposited by feeing targets sputtering and magnetron sputtering method", Mat. Res. Soc. Symp. Proc. Vol. 239 pp. 653-658(1992)
3. Y. Maeda and M. Takahashi: " Segregated micro structure growth in sputtered Co-Cr films", IEEE Trans, on Mag. MAG-24,pp. 3012-33014(1988)
4. ASYMPTOTIC CALORIMETER, Hy-Cal Engineering [5]. S. Nakahara, : " Microporosity in thin films" Thin Solid Films, 64, pp. 149-161 (1979)
5. D.M. Mattox " Particle bombardment effects on thin-film deposition: A review" J. Vac. Sci. Technol. A7(3) pp. 1105-1114(1989)