Plasma effects on the Co-Cr deposition in opposing targets sputtering method

IEEE Transactions on Magnetics

Volumn 18, Issue 6, 1982, Pages 1113-1115

  Kadokura, S ^a   Naoe, M ^b  

^a TEIJIN LTD   (Japan)

^b TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DATA STORAGE, MAGNETIC - FILM; SPUTTERING;

MAGNETIC MATERIALS;

EID: 0020204448     PISSN: 00189464     EISSN: 19410069     Source Type: Journal    
DOI: 10.1109/TMAG.1982.1062159     Document Type: Article

References (7)

1. S. Kadokura, T. Tomie, and M. Naoe; IEEE Trans, on Mag., Vol. MAG-17, pp. 3175 (1981)
2. S. Iwasaki and K. Ouchi; IEEE Trans. on Mag., Vol. MAG-14, pp. 849 (1978)
3. S. Iwasaki, K. Ouchi, and N. Honda; IEEE Trans. on Mag., Vol. MAG-16, pp. Ill (1980)
4. Y. Uesaka, S. Hishiyama, and H. Fujiwara; Proc. of 1982 SENDAI SYMP. on Perpendicular Magnetic Recording, pp. 169 (1982)
5. R. Sugita, T. Kunieda, and F. Kobayashi; IEEE Trans. on Mag., Vol. MAG-17, pp. 3172 (1981)
6. Y. Maeda, S. Hirono, I. Hatakeyama, and K. Nonaka; Proc. of 1982 SENDAI SYMP. on Perpendicular Magnetic Recording, pp. 193 (1982)
7. T. Coughlin, J. H. Judy, and E. R. Wouri: IEEE Trans, on Mag., Vol. MAG-17, pp. 3169 (1981)