Two-dimensional imaging of laser-induced fluorescence: oh in a plasma-generated molecular beam scattering from a silicon surface

IEEE Transactions on Plasma Science

Volumn 24, Issue 1, 1996, Pages 79-80

  Buss, Richard J ^a   Ho, Pauline ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHARGE COUPLED DEVICES; ELECTRON SCATTERING; FLUORESCENCE; FREE RADICALS; IMAGING TECHNIQUES; LASER APPLICATIONS; MOLECULAR BEAMS; REACTIVITY (NUCLEAR); SEMICONDUCTING SILICON; SURFACES;

HYDROXIDES; IMAGING OF RADICALS INTERACTING WITH SURFACES; MOLECULAR TRANSLATION; OPTICAL TRANSITION; PLASMA GENERATED RADICALS; SILICON SURFACE; TWO DIMENSIONAL IMAGING;

PLASMAS;

EID: 0030085347     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/27.491700     Document Type: Article

References (5)

1. M. I. Kushner and D. B. Graves, Eds.Special issue on modeling of collisional low-temperature plasmas," IEEE Trans. Plasma Sci., vol. 19, 1991.
2. P. Ho, W. G. Breiland, and R. J. BussLaser studies of the reactivity of SiH with the surface of a depositing film," J. Chem. Phys., vol. 91, pp. 2627-2634, 1989.
3. R. J. Buss, P. Ho, and M. E. WeberLaser studies of the reactivity of SiO with the surface of a depositing film," Plasma Chem. Plasma Process, vol. 13. pp. 61-70, 1993.
4. -) with the surface of silicon nitride," J. Phys. Chem., vol. 96, pp. 9855-9861, 1992.
5. 2II) with oxidized silicon nitride and PMMA film surfaces, J. Phys. Chem., vol. 97, pp. 10287-10294, 1993.