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Plasma Chemistry and Plasma Processing

Volumn 13, Issue 1, 1993, Pages 61-76

Laser studies of the reactivity of SiO with the surface of a depositing film

(3) Buss, Richard J a Ho, Pauline a Weber, M E b

a SANDIA NATIONAL LABORATORIES (United States)

b TEXAS INSTRUMENTS (United States)

Author keywords

Gas surface reactions; IRIS technique; SiO plasma film deposition

Indexed keywords

CHEMICAL REACTIONS; DEPOSITION; FILMS; IMAGING TECHNIQUES; PLASMA APPLICATIONS;

GAS SURFACE REACTIONS; IRIS TECHNIQUE; PLASMA FILM DEPOSITION;

SILICON COMPOUNDS;

EID: 0027560940 PISSN: 02724324 EISSN: 15728986 Source Type: Journal
DOI: 10.1007/BF01447170 Document Type: Article

Times cited : (16)

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