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Volumn 81, Issue 8, 1997, Pages 3501-3511

Microstructure and strain relaxation in organometallic vapor phase epitaxy of strain-compensated GaInP/InAsP multilayers on InP(001)

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0012812675     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.365049     Document Type: Article
Times cited : (13)

References (40)
  • 9
    • 85033183752 scopus 로고    scopus 로고
    • Ph.D. dissertation, École Polytechnique de Montréal
    • Y. Ababou, Ph.D. dissertation, École Polytechnique de Montréal, 1996.
    • (1996)
    • Ababou, Y.1
  • 24
    • 85033164184 scopus 로고    scopus 로고
    • note
    • The low and high exit angle geometries provide the same structural information. However, the low-exit angle configuration, in addition to being more surface sensitive, provides additional practical advantages, including a smaller irradiated area, thus facilitated sample positioning and an experimental geometry that is less sensitive to the diffractiometer alignment.
  • 29
    • 85033175242 scopus 로고    scopus 로고
    • note
    • Since the 0th-order superlattice peak and the substrate peak almost coincide for strain-compensated structures, the determination of the in-plane relaxation from the asymmetric 115 ω-2θ curves is nearly impossible. RLM is therefore essential to quantify the strain relaxation of these structures.
  • 30
    • 85033172719 scopus 로고    scopus 로고
    • note
    • The high exit angle geometry has been used because we measured almost no intensity for the film using the 224 reflection which has a higher surface sensitivity.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.