Fabrication of silicon stencil masks with vitreous carbon ion-absorbing coatings

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 6, 1998, Pages 3599-3601

  Ruchhoeft, P ^a   Wolfe, J C ^a   Wasson, J ^a   Torres, J ^a   Wu, H ^a   Nounu, H ^a   Liu, N ^a   Herbordt, M ^a   Morgan, M D ^b   Tiberio, R C ^c  

^a UNIVERSITY OF HOUSTON   (United States)

^b EDTEK Inc   (United States)

^c Cornell University ^*  (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0012714532     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590385     Document Type: Article

References (6)

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2. J. C. Wolfe, S. V. Pendharkar, P. Ruchhoeft, S. Sen, M. D. Morgan, W. E. Horne, R. C. Tiberio, and J. N. Randall, J. Vac. Sci. Technol. B 14, 3896 (1996).
3. G. Gross, R. Kaesmaier, H. Löschner, and G. Stengl, J. Vac. Sci. Technol. B (these proceedings).
4. I. W. Rangelow et al., J. Vac. Sci. Technol. B (these proceedings).
5. S. V. Pendharkar and J. C. Wolfe, J. Vac. Sci. Technol. B 13, 2588 (1995).
6. M. D. Morgan, W. E. Horne, V. Sundaram, J. C. Wolfe, S. V. Pendharkar, and R. C. Tiberio, J. Vac. Sci. Technol. B 14, 3903 (1996).