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Volumn 89, Issue 1, 2001, Pages 42-46

Mechanical strain and damage in Si implanted with O and N ions at elevated temperatures: Evidence of ion beam induced annealing

Author keywords

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Indexed keywords


EID: 0012594667     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1330254     Document Type: Article
Times cited : (16)

References (13)
  • 9
    • 0040035702 scopus 로고
    • edited by D. V. Morgan (Wiley, New York)
    • F. Eisen, in Channeling, edited by D. V. Morgan (Wiley, New York, 1973), p. 417.
    • (1973) Channeling , pp. 417
    • Eisen, F.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.