Damage accumulation in Si crystal during ion implantation at elevated temperatures: Evidence of chemical effects

Journal of Applied Physics

Volumn 87, Issue 12, 2000, Pages 8385-8388

  De Souza, J P ^a   Suprun Belevich, Yu ^a   Boudinov, H ^a   Cima, C A ^a  

^a FEDERAL UNIVERSITY OF RIO GRANDE DO SUL   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001543783     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.373551     Document Type: Article

References (13)

1. J. Linnros, R. G. Elliman, and W. L. Brown, J. Mater. Res. 3, 1208 (1988).
2. O. W. Holland, J. D. Budai, and B. Nielsen, Mater. Sci. Eng., A 253, 240 (1998).
3. A. E. White, K. T. Short, R. C. Dymes, J. M. Gibson, and R. Hull, Mater. Res. Soc. Symp. Proc. 107, 3 (1988).
4. O. W. Holland, D. S. Zhou, and D. K. Thomas, Appl. Phys. Lett. 63, 896 (1993).
5. O. W. Holland and C. W. White, Nucl. Instrum. Methods Phys. Res. B 59/60, 353 (1991).
6. D. Venables and K. S. Jones, Nucl. Instrum. Methods Phys. Res. B 74, 65 (1993).
7. D. Venables, K. S. Jones, F. Namavar, and J. M. Manke, Mater. Res. Soc. Symp. Proc. 235, 103 (1992).
8. F. Eisen, in Channelling, edited by D. V. Morgan (Wiley, New York, 1973), p. 417.
9. J. P. Ziegler, J. P. Biersack, and U. Littmark, The Stopping and Range of Ions in Solids (Pergamon, New York, 1985).
10. O. W. Holland (private communication).
11. Yu. Suprun-Belevich, F. Cristiano, A. Nejim, P. L. F. Hemment, and B. J. Sealy, Nucl. Instrum. Methods Phys. Res. B 140, 91 (1998).
12. E. Kasper and F. Schäffler, Semicond. Semimet. 33, 223 (1991).
13. Handbook of Material Science, edited by C. T. Lynch (Chemical Rubber, Cleveland, 1974), Vol. 1.