Structural characterization of ultrathin nanocrystalline silicon films formed by annealing amorphous silicon

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 5, 1998, Pages 2802-2805

  Lutzen J ^a   Kamal, A H M ^a   Kozicki, M N ^a   Ferry, D K ^a   Sidorov, M V ^a   Smith, David J ^a  

^a ARIZONA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0012348638     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590275     Document Type: Article

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