Electrical Properties and Temperature-Humidity Studies of Fluorocarbon Films Deposited from Pentafluoroethane/Argon Plasmas

Journal of the Electrochemical Society

Volumn 148, Issue 5, 2001, Pages

  Agraharam, Sairam ^a   Hess, Dennis W ^a   Kohl, Paul A ^a   Allen, Sue Ann Bidstrup ^a  

^a Georgia Institute of Technology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0011505034     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1366629     Document Type: Article

References (13)

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