Internal Atomic Distortion and Layer Roughness of Epitaxial SiC Thin Films Studied by Short Wavelength X-Ray Diffraction

Physical Review Letters

Volumn 84, Issue 9, 2000, Pages 1926-1929

  Xu, G ^a,b   Feng, Z C ^c  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b MCMASTER UNIVERSITY   (Canada)

^c INSTITUTE OF MATERIALS RESEARCH AND ENGINEERING   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0011180948     PISSN: 00319007     EISSN: 10797114     Source Type: Journal    
DOI: 10.1103/PhysRevLett.84.1926     Document Type: Article

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