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Volumn 72, Issue 1, 2001, Pages 85-87
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Improvement of metal-ferroelectric-silicon structures without buffer layers between Si and ferroelectric films
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Author keywords
[No Author keywords available]
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Indexed keywords
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EID: 0011075312
PISSN: 09478396
EISSN: None
Source Type: Journal
DOI: 10.1007/s003390000568 Document Type: Article |
Times cited : (11)
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References (9)
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