Sloped irradiation techniques in deep X-ray lithography for 3-d shaping of microstructures

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3048, Issue , 1997, Pages 136-145

  Feiertag, Gregor ^a   Ehrfeld, Wolfgang ^a   Lehr, Heinz ^a   Schmidt, Martin ^a  

^a INSTITUT FÜR MIKROTECHNIK MAINZ GMBH   (Germany)

Author keywords

Deep X ray lithography; DXRL; LIGA; Microfabrication; Multidirectional inclined microstructures; Multiple irradiation; Tilted irradiation; X ray scanner

Indexed keywords

IRRADIATION; MICROFABRICATION; MICROSTRUCTURE; SYNCHROTRON RADIATION; X RAYS;

DEEP X-RAY LITHOGRAPHY; DXRL; LIGA; MULTIPLE IRRADIATION; X-RAY SCANNER;

X RAY LITHOGRAPHY;

EID: 0010953129     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.275770     Document Type: Conference Paper

References (15)

1. W. Ehrfeld and D. MUnchmeyer, "Three-dimensional microfabrication using synchrotron radiation", Nuci. Instr. and Meth. in Phys. Research A 303, pp. 523-53 1, 1991.
2. W. Ehrfeld and H. Lehr, "Deep X-Ray Lithography for the Production of Three-dimensional Microstructures from Metals, Polymers and Ceramic ", Radiat. Phys. Chem. 45, 3, pp. 349-365, 1995.
3. M. Schmidt, W. Ehrfeld, G. Feiertag, H. Lehr, A. Schmidt, "Deep X-ray Lithography for Microfabrication", Synchrotron Radiation News Vol. 9, No. 3, pp. 36-41, 1996.
4. W. Ehrfeld, V. Hessel, H. Möbius, T. Richter, K. Russow, "Potentials and Realisation of Microreactors", Microsystem Technology for Chemical and Biochemical Microreactors, Dechema Monograph 1 32, VCH, Weinheim, Germany, 1996.
5. L. Weber, W. Ehrfeld, H. Freimuth, M. Lacher, H. Lehr, B. Pech, "Micro molding-A powerful tool for the large scale production of precise microstructures", Proc of SPIE Symp. "Micromachining and Microfabrication", Austin, USA, SPIE Vol 2879, pp. 156-167, 1996.
6. H. Lehr, W. Ehrfeld, "Advanced Microstructure Products by Synchrotron Radiation Lithography", Journal de Physique IV, C9, Vol. 4, 1994.
7. A. Schmidt, W. Ehrfeld, H. Lehr, L. MUller, F. Reuther, M. Schmidt, T. Zetterer, "Aligned Double Exposure in Deep X-ray Lithography", Microelectronic Engineering 30, pp. 235-23 8, 1996.
8. G. Feiertag, Rontgentiefenlithographische Mikrostrukturfertigung: Genauigkeit der Abbildung und Strukturierung durch Schragbelichtung, Chapter 4 and 5 (in German), Fortschritt-Berichte VDI, Reihe 9, Nr. 242, VDI Verlag, DUsseldorf, Germany, 1996.
9. G. Feiertag, W. Ehrfeld, H. Lehr, A. Schmidt, M. Schmidt, "Accuracy of structure transfer in deep X-ray lithography", Microelectronic Engineering 1997 in press.
10. H.O. Moser, W. Ehrfeld, M. Lacher, H. Lehr, "Fabrication of 3D Microdevices from Metals, Plastics and Ceramic Materials", Proc. of 1st Japanese-French Congress of Mechatronics 1992, Besançon, France, 1992.
11. C. Beuret, G.-A. Racine, J. Gobet, R. Luthier, N. F. de Rooij, "Microfabrication of 3D Multidirectional Inclined Structures by UV-Lithography and Electroplating", Proc. of IEEE Micro Electro Mechanical Systems Conference 1994, IEEE Catalog 94CH3404-1, pp. 81-85, 1994.
12. R. Schenk, O. Halle, K. MUllen, W. Ehrfeld, M. Schmidt, "Highly sensitive resist material for deep X-ray lithography", Microelectronic Engineering 1997 in press.
13. H. Lowe, W. Ehrfeld, H. Lehr, M. Nopper, "Electroforming of 3D Microstructures from Metal alloys", Microelectronic Engineering 1997 in press.
14. G. Feiertag, W. Ehrfeld, H. Freimuth, H. Lehr, M. Schmidt, R. Weiel, G. Kiriakidis, J. Pedersen, C. Soukoulis, "Fabrication of Three-Dimensional Photonic Crystals by Deep X-ray Lithography", Proc. of the mt. Symposium on Microsystems, Intelligent Materials and Robots 1995, Sendai, Japan, pp. 37-40, 1995.
15. G. Feiertag, W. Ehrfeld, H. Freimuth, G. Kiriakidis, H. Lehr, T. Pedersen, M. Schmidt, C. Soukoulis, R. Weiel, "Fabrication of three-dimensional photonic band gap materials by deep X-ray lithography", Photonic Band Gap Materials, Editor: C. Soukoulis, Nato AS Series E, Vol. 315, Kluwer Academic, Dordrecht, Netherlands, pp. 63-69, 1996.