Metrology of scattering with angular limitation projection electron lithography masks

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 6, 1997, Pages 2197-2203

  Liddle, J A ^a   Blakey, M I ^a   Saunders, T ^a   Farrow, R C ^a   Fetter, L A ^a   Knurek, C S ^a   Kasica, R ^a   Novembre, A E ^a   Peabody, M L ^a   Tennant, D M ^a   Windt, D L ^a   Postek, M ^b  

^a LUCENT TECHNOLOGIES   (United States)

^b NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0010399020     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589613     Document Type: Article

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