Contrast enhancement based on acid equilibrium for chemically amplified resists

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 39, Issue 4 A, 2000, Pages 1944-1950

  Nakazawa, Keisuke ^a,b   Sasago, Masaru ^a,c  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

^b SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

^c PANASONIC CORPORATION   (Japan)

Author keywords

Acid; Chemically amplified resist; Contrast enhancement; Dissociation constant; Hydrogen ion; Permittivity

Indexed keywords

EID: 0010177055     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.1944     Document Type: Article

References (12)

1. J. Nakamura, H. Ban, M. Morita and A. Tanaka: Jpn. J. Appl. Phys. 32 (1993) L813.
2. M. F. Cronin, T. Adams, T. Fedynyshyn, J. Georger, J. M. Mori and J. W. Thackeray: Proc. SPIE 2195 (1994) 214.
3. B. F. Grilling and P. R. West: Polym. Eng. Sci. 23 (1982) 947.
4. K. Ichimura, K. Arimitsu and K. Kudo: Chem. Lett. (1995) 551.
5. T. Ohfuji, M. Takahashi, M. Sasago, S. Noguchi and K. Ichimura: J. Photopolym. Sci. Technol. (1997) 551.
6. Equations for the equilibrium constant must be expressed by using the activity and activity coefficient, to be exact, rather than the concentration. However, we use an expression using the concentration to simplify the calculations. This approximation can be used for an ideal solution or dilute solutions.
7. J. F. Cordaro and M. Tomozawa: Phys. Chem. Glasses 21 (1980) 74.
8. K. Nakazawa and M. Sasago: unpublished.
9. M. Tsuda, R. Ichikawa and S. Oikavva: J. Photopolym. Sci. Technol. 5 (1992) 31.
10. J.-C. Justice: Comprehensive Treatise of Electrochemistry, eds. B. E. Conway, J. O'M. Bockris and E. Yeager (Plenum Press, New York, 1983) Vol. 5, p. 318.
11. H.-K. Oh, Y.-S. Sohn, M.-G. Sung, Y.-M. Lee, E.-M. Lee, S.-H. Byun, I. An, K.-S. Lee and I.-H. Park: Proc. SPIE 3678 (1999) 643.
12. J. Nakamura, H. Ban and A. Tanaka: J. Photopolym. Sci. Technol. 10 (1997) 479.