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Journal of Photopolymer Science and Technology

Volumn 10, Issue 3, 1997, Pages 479-484

Effect of dissociation constant of catalytic acids on the characteristics of chemically amplified resists

(3) Nakamura, Jiro a Ban, Hiroshi a Tanaka, Akinobu a

a NTT CORPORATION (Japan)

Author keywords

Acid catalyzed reaction; Chemically amplified resist; Dissociation constant

Indexed keywords

EID: 19644382381 PISSN: 09149244 EISSN: None Source Type: Journal
DOI: 10.2494/photopolymer.10.479 Document Type: Article

Times cited : (3)

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