Failure analysis of intergrated circuits beyond the defferaction limit: Contact mode near-field scanning optical microscopy with intergrated resistance, capacitance, and UV confocal imaging

Proceedings of the IEEE

Volumn 88, Issue 9, 2000, Pages 1471-1479

  Lewis, Aaron ^a   Shambrot, Efim ^b   Radko, Anna ^a   Lieberman, Klony ^b   Ezekiel, Solomon ^b   Vetnger, Dimitry ^c   Yampolski, Gila ^c  

^a HEBREW UNIVERSITY OF JERUSALEM   (Israel)

^b Nanonies Imaging Ltd   (Israel)

^c INTEL CORPORATION   (Israel)

Author keywords

Atomic force microscopy; Chemical mechanical polishing (CMP); Doped silicon; Gate oxide leakage (COX); Metal oxide semiconductor; Pulyxilicon; Scanning capacitance microscopy; Scanning resistance microscopy

Indexed keywords

EID: 0009703493     PISSN: 00189219     EISSN: None     Source Type: Journal    
DOI: 10.1109/5.883318     Document Type: Article

References (14)

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