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Volumn 8, Issue 5, 1992, Pages 193-269
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Growth and characterization of epitaxial Ni and Co silicides
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Author keywords
[No Author keywords available]
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Indexed keywords
FILMS--VAPOR DEPOSITION;
MOLECULAR BEAM EPITAXY--APPLICATIONS;
SEMICONDUCTING INTERMETALLICS--FILMS;
SEMICONDUCTOR DEVICES--INTERFACES;
SUPERLATTICES--SEMICONDUCTOR;
EPITAXIAL COBALT DISILICIDE FILMS;
EPITAXIAL NICKEL DISILICIDE FILMS;
METAL DISILICIDE DEFECT STRUCTURE;
METAL DISILICIDE FILM DEPOSITION;
METAL/DISILICIDE SCHOTTKY BARRIERS;
PERMEABLE-BASE TRANSISTOR MATERIALS;
SEMICONDUCTOR DEVICES;
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EID: 0026866232
PISSN: 09202307
EISSN: None
Source Type: Journal
DOI: 10.1016/0920-2307(92)90003-J Document Type: Review |
Times cited : (229)
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References (249)
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