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Volumn 46, Issue 4, 1997, Pages 789-793

Ultralow-noise PC-based measurement system for the characterization of the metallizations of integrated circuits

Author keywords

Data acquisition; Digital control; Electromigration; Noise measurement; Spectral analysis

Indexed keywords

DATA ACQUISITION; DIGITAL CONTROL SYSTEMS; ELECTROMIGRATION; METALLIZING; PERSONAL COMPUTERS; SIGNAL NOISE MEASUREMENT; SPECTRUM ANALYSIS;

EID: 0031200284     PISSN: 00189456     EISSN: None     Source Type: Journal    
DOI: 10.1109/19.650774     Document Type: Article
Times cited : (22)

References (12)
  • 1
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    • B. Neri, A. Diligenti, and P. E. Bagnoli, "Electromigration and low-frequency resistance fluctuations in aluminum thin-film interconnections," IEEE Trans. Electron Devices, vol. ED-34, pp. 2317-2322, 1987.
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    • Neri, B.1    Diligenti, A.2    Bagnoli, P.E.3
  • 2
    • 0024481529 scopus 로고
    • A study of electromigration in aluminum and aluminum-silicon thin film resistors using noise technique
    • A. Diligenti, P. E. Bagnoli, B. Neri, S. Bea, and L. Mantellassi, "A study of electromigration in aluminum and aluminum-silicon thin film resistors using noise technique," Solid State Electron., vol. 32, pp. 11-16, 1989.
    • (1989) Solid State Electron. , vol.32 , pp. 11-16
    • Diligenti, A.1    Bagnoli, P.E.2    Neri, B.3    Bea, S.4    Mantellassi, L.5
  • 3
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    • Electrical noise and VLSI interconnect reliability
    • T. M. Chen and A. M. Yassine, "Electrical noise and VLSI interconnect reliability," IEEE Trans. Electron Devices, vol. 41, pp. 2165-2172, 1994.
    • (1994) IEEE Trans. Electron Devices , vol.41 , pp. 2165-2172
    • Chen, T.M.1    Yassine, A.M.2
  • 4
    • 0026107597 scopus 로고
    • Ultralow-noise preamplifier for low-frequency noise measurements in electron devices
    • B. Neri, B. Pellegrini, and R. Saletti, "Ultralow-noise preamplifier for low-frequency noise measurements in electron devices," IEEE Trans. Instrum. Meas., vol. 40, pp. 2-6, 1991.
    • (1991) IEEE Trans. Instrum. Meas. , vol.40 , pp. 2-6
    • Neri, B.1    Pellegrini, B.2    Saletti, R.3
  • 6
    • 84937650904 scopus 로고
    • Electromigration - A brief survey and some recent results
    • April
    • R. J. Black "Electromigration - a brief survey and some recent results," IEEE Trans. Electron Devices, vol. ED-16, p. 338, April 1969.
    • (1969) IEEE Trans. Electron Devices , vol.ED-16 , pp. 338
    • Black, R.J.1
  • 7
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    • Screening of metal film defects by current noise measurements
    • J. L. Vossen, "Screening of metal film defects by current noise measurements," Appl. Phys. Lett., vol. 23, pp. 38-42, 1976.
    • (1976) Appl. Phys. Lett. , vol.23 , pp. 38-42
    • Vossen, J.L.1
  • 9
    • 51649153677 scopus 로고
    • Variations of temperature coefficient and noise in thin Al and Al/Si Resistors subjected to high current density
    • A. Diligenti, B. Neri, A. Nannini, and S. Ciucci, "Variations of temperature coefficient and noise in thin Al and Al/Si Resistors subjected to high current density," J. Electron. Mater., vol. 20, pp. 559-565, 1991.
    • (1991) J. Electron. Mater. , vol.20 , pp. 559-565
    • Diligenti, A.1    Neri, B.2    Nannini, A.3    Ciucci, S.4
  • 11
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    • Wafer level measurement system for SARF characterization of metal lines
    • C. Ciofi, M. De Marinis, and B. Neri, "Wafer level measurement system for SARF characterization of metal lines," Microelectron. Reliab., vol. 36, pp. 1851-1854, 1996.
    • (1996) Microelectron. Reliab. , vol.36 , pp. 1851-1854
    • Ciofi, C.1    De Marinis, M.2    Neri, B.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.