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Volumn , Issue , 2000, Pages 461-464

Long-range coulomb interactions in small silicon devices: Transconductance and mobility degradation

Author keywords

Coulomb interactions; Mobility; Monte carlo simulations; MOS transistors; VLSI scaling

Indexed keywords

COMPUTER SIMULATION; MONTE CARLO METHODS; MOSFET DEVICES; QUANTUM THEORY; SEMICONDUCTING SILICON; TRANSCONDUCTANCE; VLSI CIRCUITS;

EID: 0007927567     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (1)

References (24)
  • 2
    • 35949009958 scopus 로고
    • M. V. Fischetti and S. E. Laux, Phys. Rev. B 38, 9721 (1988); S. E. Laux and M. V. Fischetti, in Monte Carlo Device Simulation: Full Band and Beyond, Karl Hess ed. (Kluwer, Boston, Massachusetts, 1991).
    • (1988) Phys. Rev. B , vol.38 , pp. 9721
    • Fischetti, M.V.1    Laux, S.E.2
  • 14
    • 6344269051 scopus 로고    scopus 로고
    • http://www.research.ibm.com/DAMOCLES/html_files/mueff.html
  • 19
    • 6344275132 scopus 로고    scopus 로고
    • ox, should not play a major role at high gate doping and large electron sheet densities
    • ox, should not play a major role at high gate doping and large electron sheet densities.
    • (1998) IEDM Tech. Dig. , vol.571
    • Krishnan, M.S.1
  • 22
    • 0023980804 scopus 로고
    • A large momentum-transfer rate between electron layers across a dielectric has been previously obtained by C. Jacoboni and P. J. Price, Solid-State Electron. 81, 649 (1988).
    • (1988) Solid-State Electron. , vol.81 , pp. 649
    • Jacoboni, C.1    Price, P.J.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.