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Volumn 44, Issue 1-3, 1997, Pages 387-391

Critical material and processing issues of SiC electronic devices

Author keywords

Fabrication problems; Semiconductors; Silicon carbide

Indexed keywords

CRYSTAL DEFECTS; CRYSTAL GROWTH; DIELECTRIC MATERIALS; ENERGY GAP; ION IMPLANTATION; MOS DEVICES; OHMIC CONTACTS; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DOPING; SINGLE CRYSTALS; SUBSTRATES;

EID: 0006815908     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(96)01746-1     Document Type: Article
Times cited : (21)

References (28)
  • 8
    • 0002144627 scopus 로고    scopus 로고
    • M.M. Rahman, C.Y.-W. Yang and G.L. Harris (eds.), Amorphous and Crystalline Silicon Carbide II, Springer, New York
    • T. Nakata, K. Koga, Y. Matsushita, Y. Ueda and T. Niina, in M.M. Rahman, C.Y.-W. Yang and G.L. Harris (eds.), Amorphous and Crystalline Silicon Carbide II, Springer Proceedings in Physics, Vol. 43, Springer, New York, p. 26.
    • Springer Proceedings in Physics , vol.43 , pp. 26
    • Nakata, T.1    Koga, K.2    Matsushita, Y.3    Ueda, Y.4    Niina, T.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.