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Journal of the Electrochemical Society

Volumn 143, Issue 1, 1996, Pages 228-232

Al-Ge reflow sputtering for submicron contact hole filling

(2) Kikuta, K a Kikkawa, T a

a NEC CORPORATION (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; DRY ETCHING; ELECTRIC CONDUCTIVITY MEASUREMENT; GERMANIUM ALLOYS; HIGH TEMPERATURE PROPERTIES; LEAKAGE CURRENTS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON; SILICA; SPUTTERING; SUBSTRATES;

ALUMINUM ALLOY REFLOW TECHNOLOGY; LOW PRESSURE CHEMICAL VAPOR DEPOSITION; MOLYBDENUM SILICIDE; SPUTTERING TEMPERATURE; SUBSTRATE TEMPERATURE; THERMAL OXIDATION; TITANIUM TUNGSTEN;

ALUMINUM ALLOYS;

EID: 0029732734 PISSN: 00134651 EISSN: None Source Type: Journal
DOI: 10.1149/1.1836413 Document Type: Article

Times cited : (3)

References (13)

1
- 0023293652
- R. Mukai, N. Sasaki, and M. Nakano, IEEE Trans. Electron. Device Lett., EDL-8, 76 (1987).
- (1987) IEEE Trans. Electron. Device Lett. , vol.EDL-8 , pp. 76
- Mukai, R.¹ Sasaki, N.² Nakano, M.³

2
- 5844391029
- R. Liu, K. P. Cheung, and W. Y. C. Lai, in Proceedings of the Sixth International IEEE VMIC Conference, p. 329 (1989).
- (1989) Proceedings of the Sixth International IEEE VMIC Conference , pp. 329
- Liu, R.¹ Cheung, K.P.² Lai, W.Y.C.³

3
- 0042798281
- R. J. Baseman, J. Vac. Sci. Technol., B8, 84 (1990).
- (1990) J. Vac. Sci. Technol. , vol.B8 , pp. 84
- Baseman, R.J.¹

4
- 0023435427
- V. Hoffman, J. Griswold, D. Mints, and D. Harra, Thin Solid Films, 153, 369 (1987).
- (1987) Thin Solid Films , vol.153 , pp. 369
- Hoffman, V.¹ Griswold, J.² Mints, D.³ Harra, D.⁴

5
- 0012038163
- M. Inoue, K. Hashizume, and H. Tsuchikawa, J. Vac. Sci. Technol., A6, 1636 (1988).
- (1988) J. Vac. Sci. Technol. , vol.A6 , pp. 1636
- Inoue, M.¹ Hashizume, K.² Tsuchikawa, H.³

6
- 0024937715
- G. E. Georgiou, K. P. Cheung, and R. Liu, in Proceedings of the Sixth International IEEE VMIC Conference, p. 315 (1989).
- (1989) Proceedings of the Sixth International IEEE VMIC Conference , pp. 315
- Georgiou, G.E.¹ Cheung, K.P.² Liu, R.³

7
- 0025530774
- H. Ono, Y. Ushiku, and T. Yoda, in Proceedings of the Seventh International IEEE VMIC Conference, p. 76 (1990).
- (1990) Proceedings of the Seventh International IEEE VMIC Conference , pp. 76
- Ono, H.¹ Ushiku, Y.² Yoda, T.³

8
- 0025578865
- F. S. Chen, Y. S. Lin, G. A. Dixit, R. Sundaresan, C. C. Wei, and F. T. Liou, IEDM Tech. Digest, 51 (1990).
- (1990) IEDM Tech. Digest , pp. 51
- Chen, F.S.¹ Lin, Y.S.² Dixit, G.A.³ Sundaresan, R.⁴ Wei, C.C.⁵ Liou, F.T.⁶

9
- 3342921930
- B. S. Lim, W. C. Pritchet, K. P. Rodbell, and K. N. Tu, J. Appl. Phys., 74, 2945 (1993).
- (1993) J. Appl. Phys. , vol.74 , pp. 2945
- Lim, B.S.¹ Pritchet, W.C.² Rodbell, K.P.³ Tu, K.N.⁴

10
- 0027556047
- K. N. Tu, K. P. Rodbell, S. R. Herd, and D. J. Mikalsen, Mater. Chem. Phys., 33, 225 (1993).
- (1993) Mater. Chem. Phys. , vol.33 , pp. 225
- Tu, K.N.¹ Rodbell, K.P.² Herd, S.R.³ Mikalsen, D.J.⁴

11
- 0026382537
- K. Kikuta, T. Kikkawa, and H. Aoki, Symposium on VLSI Technology, p. 35 (1991).
- (1991) Symposium on VLSI Technology , pp. 35
- Kikuta, K.¹ Kikkawa, T.² Aoki, H.³

12
- 85056510182
- H. Nishimura, T. Yamada, R. Sinclair, and S. Ogawa, Symposium on VLSI Technology, p. 74 (1992).
- (1992) Symposium on VLSI Technology , pp. 74
- Nishimura, H.¹ Yamada, T.² Sinclair, R.³ Ogawa, S.⁴

13
- 0016125737
- J. O. McCaldin, J. Vac. Sci. Technol., 11, 990 (1974).
- (1974) J. Vac. Sci. Technol. , vol.11 , pp. 990
- McCaldin, J.O.¹

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