Developments in focused ion beam metrology

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3507, Issue , 1998, Pages 216-224

  Salen, Jesse A ^a   Athas, Gregory J ^a   Barnes, Drew ^a   Bassom, Neil J ^a   Yansen, Don E ^a  

^a Micrion Corp   (United States)

Author keywords

Critical dimension (CD); Focused ion beam (FIB); Metrology; Micro electromechanical devices (MEMS); Modulation transfer function (MTF); Thin film heads (TFH)

Indexed keywords

DEPOSITION; IMAGE QUALITY; ION BEAMS; MICROELECTROMECHANICAL DEVICES; OPTICAL TRANSFER FUNCTION; THIN FILMS;

CRITICAL DIMENSION; FOCUSED ION BEAM; THIN FILM HEAD TRIMMING;

INTEGRATED CIRCUIT MANUFACTURE;

EID: 0006583699     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.324349     Document Type: Conference Paper

References (10)

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