The physics of metrology instruments

Solid State Technology

Volumn 41, Issue 6, 1998, Pages 135-147

  Davidson, Mark ^a   Vladar, Andras E ^b  

^a Spectel Company   (United States)

^b HEWLETT PACKARD COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; DYNAMIC RANDOM ACCESS STORAGE; SCANNING ELECTRON MICROSCOPY;

SCANNING PROBE MICROSCOPY (SPM);

INTEGRATED CIRCUIT MANUFACTURE;

EID: 0032083942     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (10)

1. D. McMullan, "Scanning Electron Microscopy 1928-1965," Scanning, Vol. 17, pp. 175-185, 1995.
2. E. Ruska, "The Development of the Electron Microscope and of Electron Microscopy," Reviews of Modern Physics, Vol. 59, pp. 627-638, 1987.
3. T. Wilson, C. Sheppard, Theory and Practice of Scanning Optical Microscopy, Academic Press, 1984.
4. M. Davidson, et al., "An Application of Interference Microscopy to Integrated Circuit Inspection and Metrology," Proceedings SPIE Microlithography Conference, Santa Clara, Vol. 775, pp. 233-241, March 1987.
5. G.S. Kino, T.R. Corle, G.Q. Xiao, "New types of Scanning Optical Microscopes," Integrated Circuit Metrology, Inspection, and Process Control II, Vol. 921, SPIE, 1988.
6. G. Binning, H. Roher, C. Gerber, E. Weibel, "Surface Studies by Scanning Tunneling Microscopy," Phys. Rev. Lett., Vol. 49, pp. 57-61, 1982.
7. G. Binning, C.F. Quate, C. Gerber, "Atomic Force Microscope," Phys. Rev. Lett., Vol. 56, pp. 930-933, 1986.
8. E.H. Synge, "A Suggested Method for Extending Microscopic Resolution into the Ultra-Microscopic Region," Phil. Mag., Vol. 6, pp. 356-362, 1920.
9. L. Reimer, Scanning Electron Microscopy, Springer-Verlag, Berlin, 1985.
10. J.I. Goldstein et al., Scanning Electron Microscopy and Electron X-Ray Microanalysis, Plenum, New York, 1992.