Effects of phosphorus on stress of multi-stacked polysilicon film and single crystalline silicon

Journal of Micromechanics and Microengineering

Volumn 9, Issue 3, 1999, Pages 252-263

  Lee, Chang Seung ^a   Lee, Jong Hyun ^b   Choi, Chang Auck ^b   No, Kwangsoo ^a   Wee, Dang Moon ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0006360186     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/9/3/306     Document Type: Article

References (33)

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