Localized electron trapping and trap distributions in SiO2 gate oxides

Applied Physics Letters

Volumn 71, Issue 21, 1997, Pages 3123-3125

  Ludeke, R ^a   Wen, H J ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0006358530     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.120266     Document Type: Article

References (16)

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