Investigation of a half-wave method for birefringence or thickness measurements of a thick, semitransparent, uniaxial, anisotropic substrate by use of spectroscopic ellipsometry

Applied Optics

Volumn 39, Issue 25, 2000, Pages 4649-4657

  Kildemo, M ^b   Mooney, M ^a   Sudre, C ^a   Kelly, P V ^a  

^a UNIVERSITY COLLEGE CORK   (Ireland)

^b NORWEGIAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Norway)

Author keywords

[No Author keywords available]

Indexed keywords

ELLIPSOMETRY; SAPPHIRE; SILICON WAFERS; SUBSTRATES;

SPECTROSCOPIC ELLIPSOMETRY;

BIREFRINGENCE;

EID: 0005885022     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.39.004649     Document Type: Article

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