메뉴 건너뛰기




Volumn 61, Issue 20, 2000, Pages 13923-13928

Effects of thermally activated hole escape mechanism on the optical and electrical properties in p-type Si δ-doped layers

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0005600923     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.61.13923     Document Type: Article
Times cited : (4)

References (23)
  • 1
    • 0004066963 scopus 로고    scopus 로고
    • For a recent and complete review, see Delta-doping of Semiconductors, edited by E. F. Schubert (Cambridge University Press, Cambridge, 1996).
    • (1996) Delta-doping of Semiconductors
  • 12
    • 0042090451 scopus 로고
    • H.-J Gossmann and F. C. Unterwald, Phys. Rev. B 47, 12 618 (1993).
    • (1993) Phys. Rev. B , vol.47 , pp. 12618
    • Unterwald, F.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.