Sensitization of Er3+ emission at 1.5 μm in SiO2 thermally grown on silicon by coimplantation of Yb

Applied Physics Letters

Volumn 75, Issue 6, 1999, Pages 793-795

  Kozanecki, A ^a,b   Homewood, K ^a   Sealy, B J ^a  

^a UNIVERSITY OF SURREY   (United Kingdom)

^b INSTITUTE OF PHYSICS   (Poland)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0005401987     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.124515     Document Type: Article

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