Excitation of Er3+ ions in silicon dioxide films thermally grown on silicon

Applied Physics Letters

Volumn 73, Issue 20, 1998, Pages 2929-2931

  Kozanecki, A ^a   Stepikhova, M ^b   Lanzerstorfer, S ^b   Jantsch, W ^b   Palmetshofer, L ^b   Sealy, B J ^c   Jeynes, C ^c  

^a INSTITUTE OF PHYSICS   (Poland)

^b JOHANNES KEPLER UNIVERSITY LINZ   (Austria)

^c UNIVERSITY OF SURREY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0005436767     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.122633     Document Type: Article

References (14)

1. S. Coffa and L. Tsybeskov, Mater. Res. Bull. 23/4, 16 (1998).
2. Y. C. Yan, A. J. Faber, H. de Waal, P. G. Kik, and A. Polman, Appl. Phys. Lett. 71, 2922 (1997).
3. Y. Hibino, T. Kitagawa, M. Shimizu, F. Hanawa, and A. Sugita, IEEE Photonics Technol. Lett. 1, 349 (1989).
4. P. G. Kik and A. Polman, Mater. Res. Bull. 23/4, 48 (1998).
5. V. P. Gapontsev, S. M. Matitsin, A. A. Isineev, and V. B. Kravchenko, Opt. Laser Technol., 189 (1982).
6. E. Snoeks, G. N. van den Hoven, and A. Polman, J. Appl. Phys. 73, 8179 (1993).
7. E. Snoeks, G. N. van den Hoven, A. Polman, B. Hendriksen, M. B. J. Diemeer, and F. Priolo, J. Opt. Soc. Am. B 12, 1468 (1997).
8. J. T. Kringlebotn, P. R. Morkel, L. Reekie, J.-L. Archambault, and D. N. Payne, IEEE Photonics Technol. Lett. 5, 1162 (1993).
9. J. Nilsson, P. Scheer, and B. Jaskorzyńska, IEEE Photonics Technol. Lett. 6, 383 (1994).
10. J. C. Souriau, R. Romero, C. Borel, C. Wyon, C. Li, and R. Moncorgé, Appl. Phys. Lett. 64, 1189 (1993).
11. J. A. Hutchinson and T. H. Allik, Appl. Phys. Lett. 60, 1424 (1992).
12. S. Taccheo, P. Laporta, and O. Svelto, Appl. Phys. Lett. 69, 3128 (1996).
13. J. F. Ziegler, J. P. Biersack, and U. Littmark, The Stopping and Range of Ions in Solids (Pergamon, New York, 1985).
14. V. P. Gapontsev and N. S. Platonov, Dynamical Processes in Disordered Systems, edited by Yen, Materials Science Forum (Trans Tech, Aedermannsdorf, Switzerland, 1989), Vol. 51, p. 165.