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Volumn 78, Issue 3, 2001, Pages 377-379
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Electron mobility enhancement in strained SiGe vertical n-type metal-oxide-semiconductor field-effect transistors
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Author keywords
[No Author keywords available]
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Indexed keywords
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EID: 0005335421
PISSN: 00036951
EISSN: None
Source Type: Journal
DOI: 10.1063/1.1342038 Document Type: Article |
Times cited : (8)
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References (13)
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